Key Defects to Avoid in Nanoimprint Lithography - AZoNano

In this article we explore the key defects to avoid in nanoimprint lithography in nanofabrication workflows.

Nanoimprint lithography (NIL) is an advanced nanofabrication technique capable of creating patterns and structures smaller than 10 nm with low cost, high throughput, and high precision. Image Credi… [+7780 chars]

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